Comparative Study of Corrosion Behavior of LPCVD-Ti0.17Al0.83N and PVD-Ti1−xAlxN Coatings

In the present work, a low-pressure chemical vapor deposition (LPCVD) Ti0.17Al0.83N and state-of-the-art arc ion plating PVD-Ti1−xAlxN (x = 0.25, 0.55, 0.60, 0.67) coatings were deposited on cemented carbide substrate. The morphological, structural, electrochemical properties of LPCVD-Ti0.17Al0.83N compared. X-ray diffraction (XRD) results scanning electron microscopy (SEM) images revealed that coating had face-centered cubic (fcc) structure, while presenting crack-free surface morphology compressive residual stress −131.9 MPa. PVD with composition x ≤ 0.60 an fcc PVD-Ti0.33Al0.67N consisted w-AlN phases. corrosion test showed lowest current density in 3.5 wt.% NaCl solution. After 20-day immersion 5 mol/L HCl solution, displayed higher stability than coating. impedance spectroscopy (EIS) photoelectron (XPS) analysis more uniform denser passivation film, as well Al2O3 proportion Al2O3/TiO2 composite passive layer, led to outstanding resistance